Our Harmonic F1x® inspection systems enable fabs to improve yield by detecting Non-Visual Defects (NVD) optically.  These include surface and buried metallic and organic contamination, as well as other yield-killing non-uniformities that cannot be seen by other in-line tools.

Whether you’re in a high-volume, advanced fab, in pilot production, development or a research lab, there’s a Harmonic F1x® tool that will enable you to improve yield and increase fab profitability.



The Harmonic F1x® uses Time Dependent Electric Field Induced Optical Second Harmonic Generation (SHG).

The technique is a nondestructive, contactless, optical characterization method for characterizing surfaces, interfaces, thin-films, as well as bulk properties of materials.


The Harmonic F1x® utilizes Second Harmonic Generation to characterize layer thickness, electrically active impurities, structural defects, interface roughness and trapped charge density.

The resulting maps provide measurement of global uniformity and detection of localized defects. By design, Harmonic F1x® technology offers great flexibility and accommodates a wide range of materials and processes.


FemtoMetrix® Closes Series A Financing Round Led By Samsung Ventures
At the end of August, 2016, FemtoMetrix completed its first round of equity financing in a deal led by Samsung’s Venture Division. The round included financing from other related parties.

FemtoMetrix® Announces License Agreement With Boeing

“When we can redeploy our technology to help another company accelerate their innovation, we consider that a success,” said Peter Hoffman, Boeing Vice President of Intellectual Property Management.

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FemtoMetrix® Announces Korean Sales Agency With Ahtech LTS Co., Ltd.